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N-CYANOMETHYLPIPERIDINE is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

3010-03-5

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3010-03-5 Usage

Chemical Properties

clear colorless to yellow liquid after melting

Synthesis Reference(s)

Chemical and Pharmaceutical Bulletin, 21, p. 2257, 1973 DOI: 10.1248/cpb.21.2257

Check Digit Verification of cas no

The CAS Registry Mumber 3010-03-5 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,0,1 and 0 respectively; the second part has 2 digits, 0 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 3010-03:
(6*3)+(5*0)+(4*1)+(3*0)+(2*0)+(1*3)=25
25 % 10 = 5
So 3010-03-5 is a valid CAS Registry Number.
InChI:InChI=1/C7H12N2/c8-4-7-9-5-2-1-3-6-9/h1-3,5-7H2/p+1

3010-03-5 Well-known Company Product Price

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  • (Code)Product description
  • CAS number
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  • Detail
  • Alfa Aesar

  • (A12464)  1-Cyanomethylpiperidine, 98%   

  • 3010-03-5

  • 1g

  • 391.0CNY

  • Detail
  • Alfa Aesar

  • (A12464)  1-Cyanomethylpiperidine, 98%   

  • 3010-03-5

  • 5g

  • 1467.0CNY

  • Detail
  • Alfa Aesar

  • (A12464)  1-Cyanomethylpiperidine, 98%   

  • 3010-03-5

  • 25g

  • 5881.0CNY

  • Detail

3010-03-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name 2-piperidin-1-ylacetonitrile

1.2 Other means of identification

Product number -
Other names 1-PIPERIDINEACETONITRILE

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:3010-03-5 SDS

3010-03-5Relevant articles and documents

Photoredox-Catalyzed Cα-H Cyanation of Unactivated Secondary and Tertiary Aliphatic Amines: Late-Stage Functionalization and Mechanistic Studies

Yilmaz, Ozgur,Oderinde, Martins S.,Emmert, Marion H.

, p. 11089 - 11100 (2018/09/12)

This paper describes the development and mechanistic studies of a general, high-yielding amine Cα-H cyanation protocol via photoredox catalysis. Inexpensive NaCN is employed as the cyanide source and air is the external oxidant, resulting in mild and highly functional group tolerant conditions. Notably, efficient Cα-H cyanations of secondary and tertiary aliphatic amines and of complex, biologically active compounds (drugs) can be performed using the established methodology. Mechanistic studies suggest that the carboxylic acid additive has three effects: formation of a stabilizing hemiaminal intermediate, prevention of catalyst decomposition by protonating the substrate, and modulation of fluorescence quenching of the photoexcited catalyst species.

Iridium-Catalyzed Reductive Strecker Reaction for Late-Stage Amide and Lactam Cyanation

Fuentes de Arriba, ángel L.,Lenci, Elena,Sonawane, Mahendra,Formery, Odilon,Dixon, Darren J.

supporting information, p. 3655 - 3659 (2017/03/21)

A new iridium-catalyzed reductive Strecker reaction for the direct and efficient formation of α-amino nitrile products from a broad range of (hetero)aromatic and aliphatic tertiary amides, and N-alkyl lactams is reported. The protocol exploits the mild and highly chemoselective reduction of the amide and lactam functionalities using IrCl(CO)[P(C6H5)3]2 (Vaska's complex) in the presence of tetramethyldisiloxane, as a reductant, to directly generate hemiaminal species able to undergo substitution by cyanide upon treatment with TMSCN (TMS=trimethylsilyl). The protocol is simple to perform, broad in scope, efficient (up to 99 % yield), and has been successfully applied to the late-stage functionalization of amide- and lactam-containing drugs, and naturally occurring alkaloids, as well as for the selective cyanation of the carbonyl carbon atom linked to the N atom of proline residues within di- and tripeptides.

Organocatalytic Glycosylation by Using Electron-Deficient Pyridinium Salts

Das, Somnath,Pekel, Daniel,Neud?rfl, J?rg-M.,Berkessel, Albrecht

supporting information, p. 12479 - 12483 (2015/10/12)

A new organocatalytic glycosylation method based on electron-deficient pyridinium salts is reported. At ambient temperature and catalyst loadings as low as 1 mol %, 2-deoxyglycosides were formed from benzyl- and silyl-protected glycals and primary or secondary glycosyl acceptors, with excellent yields and anomeric selectivity. Mechanistic investigations point to alcohol-pyridinium conjugates (1,2-addition products) as key intermediates in the catalytic cycle.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

-

, (2010/04/23)

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Microwave-assisted beckmann rearrangement: Convenient synthesis of 1,3-diaza-bicyclo[3.2.2]nonane

Curtis, Michael P.,Bunnelle, William H.,Pagano, Thomas G.,Gopalakrishnan, Murali,Faghih, Ramin

, p. 321 - 326 (2007/10/03)

Small heterocyclic amines such as 1,3-diaza-bicyclo[3.2.2]nonane are known to be key components of biologically active molecules. A convenient synthesis of this compound utilizing a key Beckmann rearrangement of (Z)-1-aza-bicyclo[2.2. 2]octan-3-one oxime (6) with conc. H2SO4 under microwave irradiation was achieved. The desired compound (1) was obtained in 20% yield overall. Copyright Taylor & Francis LLC.

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

-

, (2008/06/13)

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Amine compounds, resist compositions and patterning process

-

, (2008/06/13)

Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.

Octahydro-indolizine and quinolizine and hexahydro-pyrrolizine

-

, (2008/06/13)

The invention features substituted fused bicyclic compounds, pharmaceutical compositions containing them, and methods of using them to treat or prevent histamine-mediated diseases and conditions.

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